Photonic Net - Workshop - Monitoring in Thin Film Production

Das detallierte Programm sieht wie folgt aus:

Program:

Monitoring and Control of Optical Deposition Processes
Henrik Ehlers
Laser Zentrum Hannover e.V., Hanover, Germany

Design and Optical Monitoring
Alexander Tikhonravov
Lomonossow University, Moscow, Russia

Optical Monitoring in Modern Deposition Processes
Detlef Arhilger
Bühler Group, Leybold Optics, Alzenau, Germany

Filter Systems
Marc Lappschies
Optic Balzers Jena GmbH, Jena, Germany

N.N.
Dirk Isfort
Carl Zeiss GmbH, Oberkochen, Germany

Optical Monitoring in IBS
Kai Starke
CEC Cutting Edge Coatings GmbH, Hanover, Germany

Chirped Mirrors
Vladimir Pervak
Ludwig-Maximilians-University, Munich, Germany

Prospects for the enhancement of PIAD processes by monitoring of optical thickness and plasma parameters
Jens Harhausen
Leibniz-Institute for Plasma Science and Technology, INP, Greifswald, Germany

Optical Monitoring: New Approaches
Sebastian Schlichting
Laser Zentrum Hannover e.V., Hanover, Germany

Automatic generation of monochromatic monitoring spreadsheets
Tatiana Amotchkina
Ludwig-Maximilians-University, Munich, Germany

Final remarks

Lab Tour LZH e.V.

Weitere Informationen erhalten Sie auf den Seiten des Veranstalters unter folgendem Link:

http://photonicnet.de/veranstaltungen/veranstaltung/monitoring-in-thin-film-production-525/